AN NPN ALGAAS/GAAS COLLECTOR-UP HBT WITH AN H+-IMPLANTED HIGH-RESISTIVITY LAYER UNDER THE EXTERNAL PARA+-GAAS BASE

被引:3
作者
YANAGIHARA, M
OTA, Y
RYOJI, A
INADA, M
机构
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS | 1990年 / 29卷 / 12期
关键词
HBT; COLLECTOR-UP; CURRENT GAIN; IDEALITY FACTOR; DIODE; H+-IMPLANTATION;
D O I
10.1143/JJAP.29.L2174
中图分类号
O59 [应用物理学];
学科分类号
摘要
The npn AlGaAs/GaAs collector-up (C-up) heterojunction bipolar transistor (HBT) with an H+-implanted high resistivity layer (HRL) under the external p+-GaAs base layer has been successfully fabricated for the first time. For suppressing parasitic current from the emitter to external base when operating foward bias voltages, the H+-implanted HRL is superior to the O+-implanted and annealed HRL or the pn junction of wide band gap under the external base.
引用
收藏
页码:L2174 / L2176
页数:3
相关论文
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