GROWTH OF SIO2 THIN-FILM BY DOUBLE-EXCITATION PHOTOINDUCED CHEMICAL VAPOR-DEPOSITION INCORPORATED WITH MICROWAVE EXCITATION OF OXYGEN

被引：11

作者：

INOUE, K

NAKATANI, Y

OKUYAMA, M

HAMAKAWA, Y

机构：

来源：

关键词：

D O I：

10.1063/1.342067

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：6496 / 6501

页数：6

共 13 条

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[7] OKABE H, 1978, PHOTOCHEMISTRY SMALL, P149
[8] SIO2 THIN-FILM PREPARED FROM SI3H8 AND O-2 BY PHOTO-CVD USING DOUBLE EXCITATION
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