HALL-MOBILITY IN DIELECTRICALLY ISOLATED SINGLE-CRYSTAL SILICON FILMS DEFINED BY ELECTROCHEMICAL ETCHING

被引:6
作者
KAMINS, TI [1 ]
机构
[1] FAIRCHILD CAMERA & INSTR CORP, RES & DEV LAB, PALO ALTO, CA 94304 USA
关键词
D O I
10.1016/0038-1101(74)90089-6
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:667 / 674
页数:8
相关论文
共 22 条
[1]   THICKNESS MEASUREMENT OF EPITAXIAL FILMS BY THE INFRARED INTERFERENCE METHOD [J].
ALBERT, MP ;
COMBS, JF .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1962, 109 (08) :709-713
[2]   THIN-FILM SILICON - PREPATATION, PROPERTIES, AND DEVICE APPLICATIONS [J].
ALLISON, JF ;
DUMIN, DJ ;
HEIMAN, FP ;
MUELLER, CW ;
ROBINSON, PH .
PROCEEDINGS OF THE IEEE, 1969, 57 (09) :1490-+
[3]   PREPARATION OF THIN SILICON CRYSTALS BY ELECTROCHEMICAL THINNING OF EPITAXIALLY GROWN STRUCTURES [J].
DIJK, HJAV ;
JONGE, JD .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1970, 117 (04) :553-&
[4]  
Grove A S, 1967, PHYS TECHNOLOGY SEMI
[6]   SILICON-ON-SAPPHIRE EPITAXIAL BIPOLAR TRANSISTORS [J].
HEIMAN, FP ;
ROBINSON, PH .
SOLID-STATE ELECTRONICS, 1968, 11 (04) :411-&
[9]   RESISTIVITY OF BULK SILICON AND OF DIFFUSED LAYERS IN SILICON [J].
IRVIN, JC .
BELL SYSTEM TECHNICAL JOURNAL, 1962, 41 (02) :387-+
[10]   HALL EFFECT AND CONDUCTIVITY IN POROUS MEDIA [J].
JURETSCHKE, HJ ;
LANDAUER, R ;
SWANSON, JA .
JOURNAL OF APPLIED PHYSICS, 1956, 27 (07) :838-839