ROLE OF HYDROGEN-ATOMS IN ANODIZED POROUS SILICON

被引:27
作者
ITO, T [1 ]
KIYAMA, H [1 ]
YASUMATSU, T [1 ]
WATABE, H [1 ]
HIRAKI, A [1 ]
机构
[1] MATSUSHITA ELECT IND CO LTD,SHIROMI,OSAKA 530,JAPAN
来源
PHYSICA B | 1991年 / 170卷 / 1-4期
关键词
D O I
10.1016/0921-4526(91)90172-B
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
Hydrogen atoms chemisorbed in anodized porous silicon (PS) during anodization in a HF solution have been investigated by using both experimental techniques and a semi-empirical calculation method. The results show important roles of chemisorbed H atoms in PS on anodization mechanisms and a slight expansion of Si-Si bond length, as in the case of the structural change and low-temperature oxidation process of PS films previously reported. Fine structures observed in the infrared absorption band of the Si-H stretching vibrations can be related to charge redistributions of H-chemisorbed Si atoms which were calculated for various clusters with Si(n)H(m) using the AM1 method. The calculation results on the Si-Si bond length in the clusters are also consistently explained in relation to slight increases in the lattice constant of PS: the origin comes from Si charges attracted by chemisorbed H atoms on the pore walls.
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页码:535 / 539
页数:5
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