HIGH-RESOLUTION ION-BEAM LITHOGRAPHY

被引：19

作者：

ECONOMOU, NP

FLANDERS, DC

DONNELLY, JP

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1981年 / 19卷 / 04期

关键词：

D O I：

10.1116/1.571237

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1172 / 1175

页数：4

共 8 条

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[6] ION-BEAM LITHOGRAPHY FOR IC-FABRICATION WITH SUBMICROMETER FEATURES [J].

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[7]

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[8] HIGH-RESOLUTION, ION-BEAM PROCESSES FOR MICROSTRUCTURE FABRICATION [J].

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