PERMANENT RADIATION EFFECTS IN COMPLEMENTARY-SYMMETRY MOS INTEGRATED CIRCUITS

被引:7
作者
POCH, W
HOLMESSI.AG
机构
[1] RCA Astro-Electronics Division, Princeton, New Jersey
关键词
D O I
10.1109/TNS.1969.4325531
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The predominant effect of radiation on a typical metal-oxide-semiconductor (MOS) transistor is a shift in the threshold or cut-off” voltage of the device. Since these devices are in other respects extremely well suited to space applications, the problem of estimating and accommodating the anticipated threshold voltage shift has been examined. This paper presents guidelines which will assist the designer to predict the limits within which the values of these changes will fall. These predictions are based on extensive tests of complementary-symmetry MOS devices, as well as the more conventional MOS transistors and integrated circuits. A parallel research program has provided a better understanding of the damage effects. The first part of the paper presents the results of radiation-testing a wide variety of MOS devices that can be used for estimating the anticipated threshold voltage shift at various dose levels. The second part of the paper presents data on the behavior of MOS devices when gate bias during irradiation is applied intermittently instead of continuously. Copyright © 1969 by The Institute of Electrical and Electronics Engineers, Inc.
引用
收藏
页码:227 / +
页数:1
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