NEW TECHNIQUE AND ANALYSIS OF ACCELERATED ELECTROMIGRATION LIFE TESTING IN MULTILEVEL METALLIZATIONS

被引：10

作者：

MURAY, LP ^{[1
]}

RATHBUN, LC ^{[1
]}

WOLF, ED ^{[1
]}

机构：

[1] CORNELL UNIV,SCH APPL & ENGN PHYS,ITHACA,NY 14853

来源：

APPLIED PHYSICS LETTERS | 1988年 / 53卷 / 15期

关键词：

D O I：

10.1063/1.99958

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

收藏

页码：1414 / 1416

页数：3

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[4] MURAY LP, UNPUB
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