PRECIPITATION AT GRAIN-BOUNDARIES IN SILICON

被引:9
作者
HAMET, JF
ABDELAOUI, R
NOUET, G
ALLAIS, G
机构
来源
MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY | 1989年 / 4卷 / 1-4期
关键词
D O I
10.1016/0921-5107(89)90231-6
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
引用
收藏
页码:143 / 145
页数:3
相关论文
共 12 条
[1]   CZOCHRALSKI GROWTH OF SILICON BICRYSTALS [J].
AUBERT, JJ ;
BACMANN, JJ .
REVUE DE PHYSIQUE APPLIQUEE, 1987, 22 (07) :515-518
[2]  
AUCOUTURIER M, 1989, IN PRESS POLYCRYSTAL
[3]   MEASUREMENT OF THE GRAIN-BOUNDARY STATES IN SEMICONDUCTORS BY DEEP-LEVEL TRANSIENT SPECTROSCOPY [J].
BRONIATOWSKI, A .
PHYSICAL REVIEW B, 1987, 36 (11) :5895-5905
[4]   TRANSIENT-CAPACITANCE MEASUREMENT OF THE GRAIN-BOUNDARY LEVELS IN SEMICONDUCTORS [J].
BRONIATOWSKI, A ;
BOURGOIN, JC .
PHYSICAL REVIEW LETTERS, 1982, 48 (06) :424-427
[5]  
BRONIATOWSKI A, 1984, POLYCRYSTALLINE SEMI, P95
[6]   DEEP LEVELS OF COPPER IN SILICON [J].
BROTHERTON, SD ;
AYRES, JR ;
GILL, A ;
VANKESTEREN, HW ;
GREIDANUS, FJAM .
JOURNAL OF APPLIED PHYSICS, 1987, 62 (05) :1826-1832
[7]  
KAMERSKI LL, 1982, J PHYS, P171
[8]  
MAURICE JL, 1989, IN PRESS POLYCRYSTAL
[9]   COPPER PRECIPITATE COLONIES IN SILICON [J].
NES, E ;
LUNDE, G .
JOURNAL OF APPLIED PHYSICS, 1972, 43 (04) :1835-&
[10]   PRECIPITATION IN HIGH-PURITY SILICON SINGLE CRYSTALS [J].
NES, E ;
WASHBURN, J .
JOURNAL OF APPLIED PHYSICS, 1971, 42 (09) :3562-&