INVESTIGATION OF CDS PASSIVATION LAYERS ON HG1-XCDXTE

被引:2
作者
KACIULIS, S [1 ]
MATTOGNO, G [1 ]
VITICOLI, S [1 ]
MARINI, ME [1 ]
CESQUI, F [1 ]
ALFUSO, S [1 ]
MERCURI, A [1 ]
机构
[1] ALENIA,I-00131 ROME,ITALY
关键词
D O I
10.1002/sia.740220144
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
CdS thin films were deposited on sapphire substrates and on the HgxCd1-xTe epitaxial and single crystal samples by using chemical decomposition on thiourea and anodic non-aqueous sulphidation techniques, respectively. The chemical composition and depth profiles of deposited films were investigated by selected area XPS combined with Ar+ ion sputtering. Lateral homogeneity of CdS films was studied by using scanning Auger microscopy. Nearly stoichiometric CdS films were obtained on sapphire and HgxCe1-xTe. The thickness, chemical composition and sputtering rate at 2 keV ion energy were determined from XPS data. In both cases (either deposited on sapphire or on HgxCd1-xTe) the CdS films were found to be very non-homogeneous in thickness.
引用
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页码:197 / 201
页数:5
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