KINETICS OF THE SIH3+O2 AND SIH3+NO2 REACTIONS

被引：20

作者：

QUANDT, RW ^{[1
]}

HERSHBERGER, JF ^{[1
]}

机构：

[1] N DAKOTA STATE UNIV,DEPT CHEM,FARGO,ND 58105

来源：

CHEMICAL PHYSICS LETTERS | 1993年 / 206卷 / 1-4期

关键词：

D O I：

10.1016/0009-2614(93)85564-5

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

The reactions SiH3+O2 and SiH3+NO2 were studied over the temperature range 235-512 K using time-resolved infrared diode laser absorption spectroscopy. Observed rate constants are k(SiH3+O2)=(2.07+/-0.34)x10(-12)exp[(469+/-60)/T] and k(SiH3+NO2)= (2.25+/-0.48)x10(-11)exp[(264+/-80)/T] cm3 molecule-1 s-1. These results are consistent with initial SiH3O2 and SiH3NO2 adduct formation followed by possible rearrangement and subsequent dissociation.

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页码：355 / 360

页数：6

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