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SILICON CHEMICAL VAPOR-DEPOSITION ONE-STEP AT A TIME - FUNDAMENTAL-STUDIES OF SILICON HYDRIDE CHEMISTRY

被引：228
作者：
JASINSKI, JM
GATES, SM
机构：
[1] IBM Research Division, T. J. Watson Research Center, Yorktown Heights
来源：
ACCOUNTS OF CHEMICAL RESEARCH | 1991年 / 24卷 / 01期
关键词：
D O I：
10.1021/ar00001a002
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
[No abstract available]
引用
收藏
页码：9 / 15
页数：7
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