CHEMICAL VAPOR-DEPOSITION OF HYDROGENATED AMORPHOUS-SILICON FROM DISILANE

被引:9
作者
BOGAERT, RJ
RUSSELL, TWF
KLEIN, MT
ROCHELEAU, RE
BARON, BN
机构
[1] UNIV DELAWARE,DEPT CHEM ENGN,NEWARK,DE 19716
[2] UNIV DELAWARE,INST ENERGY CONVERS,NEWARK,DE 19716
关键词
D O I
10.1149/1.2096383
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
引用
收藏
页码:2960 / 2968
页数:9
相关论文
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