SILICON CHEMICAL VAPOR-DEPOSITION ONE-STEP AT A TIME - FUNDAMENTAL-STUDIES OF SILICON HYDRIDE CHEMISTRY

被引：228

作者：

JASINSKI, JM

GATES, SM

机构：

[1] IBM Research Division, T. J. Watson Research Center, Yorktown Heights

来源：

ACCOUNTS OF CHEMICAL RESEARCH | 1991年 / 24卷 / 01期

关键词：

D O I：

10.1021/ar00001a002

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

[No abstract available]

引用

页码：9 / 15

页数：7

共 109 条

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