AN ADVANCED SINGLE-LEVEL POLYSILICON SUBMICROMETER BICMOS TECHNOLOGY

被引:11
作者
BRASSINGTON, MP [1 ]
ELDIWANY, MH [1 ]
RAZOUK, RR [1 ]
THOMAS, ME [1 ]
TUNTASOOD, PT [1 ]
机构
[1] NATL SEMICOND CORP,FAIRCHILD RES CTR,SANTA CLARA,CA 95052
关键词
D O I
10.1109/16.22476
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:712 / 719
页数:8
相关论文
共 14 条
  • [1] Alvarez A. R., 1984, International Electron Devices Meeting. Technical Digest (Cat. No. 84CH2099-0), P761
  • [2] BASTANI B, 1987, P S VLSI TECH, P41
  • [3] SUPPRESSION OF HOT-CARRIER EFFECTS IN SUBMICROMETER SURFACE-CHANNEL PMOSFETS
    BRASSINGTON, MP
    POULTER, MW
    ELDIWANY, M
    [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1988, 35 (07) : 1149 - 1151
  • [4] THE RELATIONSHIP BETWEEN GATE BIAS AND HOT-CARRIER-INDUCED INSTABILITIES IN BURIED-CHANNEL AND SURFACE-CHANNEL PMOSFETS
    BRASSINGTON, MP
    RAZOUK, RR
    [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1988, 35 (03) : 320 - 324
  • [5] CHIU TY, 1987, IEDM, P24
  • [6] USE OF THE POLYSILICON GATE LAYER FOR LOCAL INTERCONNECT IN A CMOS TECHNOLOGY INCORPORATING LDD STRUCTURES
    ELDIWANY, MH
    BRASSINGTON, MP
    TUNTASOOD, P
    RAZOUK, RR
    POULTER, MW
    [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1988, 35 (09) : 1556 - 1558
  • [7] INCREASED CURRENT GAIN AND SUPPRESSION OF PERIPHERAL BASE CURRENTS IN SILICIDED SELF-ALIGNED NARROW-WIDTH POLYSILICON-EMITTER TRANSISTORS OF AN ADVANCED BICMOS TECHNOLOGY
    ELDIWANY, MH
    BRASSINGTON, MP
    TUNTASOOD, P
    [J]. IEEE ELECTRON DEVICE LETTERS, 1988, 9 (05) : 247 - 249
  • [8] HOSHI N, 1986, IEDM TECH DIG, P330
  • [9] HU C, 1985, IEEE T ELECTRON DEV, V32, P584, DOI DOI 10.1109/T-ED.1985.21981
  • [10] HIGH-SPEED BICMOS TECHNOLOGY WITH A BURIED TWIN WELL STRUCTURE
    IKEDA, T
    WATANABE, A
    NISHIO, Y
    MASUDA, I
    TAMBA, N
    ODAKA, M
    OGIUE, K
    [J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1987, 34 (06) : 1304 - 1310