TIME-RESOLVED DYNAMICS OF SUBPICOSECOND LASER ABLATION

被引：108

作者：

PREUSS, S

SPATH, M

ZHANG, Y

STUKE, M

机构：

[1] Max-Planck-Institut für Biophysikalische Chemie, W-3400 Göttingen

来源：

APPLIED PHYSICS LETTERS | 1993年 / 62卷 / 23期

关键词：

D O I：

10.1063/1.109135

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The ablation of lithium niobate (LiNbO3), POLY(tetrafluoroethylene) (PTFE, teflon), poly(methylmethacrylate) (PMMA) and polyimide (PI) by 500 fs UV excimer laser pulses at 248 nm is reported. Time-resolved measurements were carried out with pulse pairs of variable delay in the range from -200 to +200 ps. The ablation rate is very sensitive to the time delay between the two pulses, and -depending on the material and fluence-can increase or decrease for very short time delays. For LiNbO3, efficient shielding is observed within a few picoseconds. For PTFE and PMMA, and the total fluence just above threshold, the ablation rate versus time delay shows an autocorrelation type behavior with a full width at half-maximum below 400 fs, since two-photon absorption dominates the ablation process. For polyimide, excited state absorption is found to decrease the ablation rate for delay times below 30 ps.

引用

页码：3049 / 3051

页数：3

共 36 条

[11] DESORPTION STIMULATED BY LASER-INDUCED SURFACE-PLASMON EXCITATION
HOHEISEL, W
JUNGMANN, K
VOLLMER, M
WEIDENAUER, R
TRAGER, F
[J]. PHYSICAL REVIEW LETTERS, 1988, 60 (16) : 1649 - 1652
[12] NANOSECOND AND FEMTOSECOND EXCIMER LASER ABLATION OF FUSED-SILICA
IHLEMANN, J
WOLFF, B
SIMON, P
[J]. APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1992, 54 (04): : 363 - 368
[13] JELLINEK HHG, 1984, J PHYS CHEM-US, V88, P3048, DOI 10.1021/j150658a024
[14] DEEP UV SUB-MICRON LITHOGRAPHY BY USING A PULSED HIGH-POWER EXCIMER LASER
KAWAMURA, Y
TOYODA, K
NAMBA, S
[J]. JOURNAL OF APPLIED PHYSICS, 1982, 53 (09) : 6489 - 6490
[15] TEMPORAL MEASUREMENTS OF PHOTOFRAGMENT ATTENUATION AT 248 NM IN THE LASER ABLATION OF POLYIMIDE IN AIR
KOREN, G
[J]. APPLIED PHYSICS LETTERS, 1987, 50 (16) : 1030 - 1032
[16] Kuper S., 1989, Microelectronic Engineering, V9, P475, DOI 10.1016/0167-9317(89)90104-4
[17] KUPER S, 1990, J PHYS CHEM-US, V94, P7514
[18] FEMTOSECOND UV EXCIMER LASER ABLATION
KUPER, S
STUKE, M
[J]. APPLIED PHYSICS B-PHOTOPHYSICS AND LASER CHEMISTRY, 1987, 44 (04): : 199 - 204
[19] KUPER S, 1989, APPL PHYS LETT, V54, P4, DOI 10.1063/1.100831
[20] KURZ H, 1987, MATER RES SOC S P, V74, P3

← 1 2 3 4 →