POLYMER DIELECTRIC FILMS

[71] PASCALE JV, 1963, MOD PLAST, V41, P239

[72] PENNEBAKER WB, UNPUBLISHED DATA

[73] PIERCE JT, 1966, T METALL SOC AIME, V236, P359

[74] ELECTRODE CONTAMINATION IN ELECTRON OPTICAL SYSTEMS [J]. PROCEEDINGS OF THE PHYSICAL SOCIETY OF LONDON SECTION B, 1953, 66 (403): : 542 - 547

[75] STRESS ANISOTROPY IN SILICON OXIDE FILMS [J]. JOURNAL OF APPLIED PHYSICS, 1963, 34 (02) : 347 - &

[76] PHOTOMASK-PHOTORESIST TECHNIQUES FOR CRYOTRON FABRICATION [J]. PROCEEDINGS OF THE IEEE, 1964, 52 (10) : 1207 - &

[77] SPACE-CHARGE-LIMITED CURRENTS IN SOLIDS [J]. PHYSICAL REVIEW, 1955, 97 (06): : 1538 - 1544

[78] SCALA LC, 1963, APR EL SOC PITTSB

[79] SCHMIDLIN F, 1962, Patent No. 3024140

[80] SYNTHESE UND UMWANDLUNGSPRODUKTE DES ACROLEINS [J]. ANGEWANDTE CHEMIE, 1950, 62 (05): : 105 - 118

[71] PASCALE JV, 1963, MOD PLAST, V41, P239

[72] PENNEBAKER WB, UNPUBLISHED DATA

[73] PIERCE JT, 1966, T METALL SOC AIME, V236, P359

[74] ELECTRODE CONTAMINATION IN ELECTRON OPTICAL SYSTEMS [J]. PROCEEDINGS OF THE PHYSICAL SOCIETY OF LONDON SECTION B, 1953, 66 (403): : 542 - 547

[75] STRESS ANISOTROPY IN SILICON OXIDE FILMS [J]. JOURNAL OF APPLIED PHYSICS, 1963, 34 (02) : 347 - &

[76] PHOTOMASK-PHOTORESIST TECHNIQUES FOR CRYOTRON FABRICATION [J]. PROCEEDINGS OF THE IEEE, 1964, 52 (10) : 1207 - &

[77] SPACE-CHARGE-LIMITED CURRENTS IN SOLIDS [J]. PHYSICAL REVIEW, 1955, 97 (06): : 1538 - 1544

[78] SCALA LC, 1963, APR EL SOC PITTSB

[79] SCHMIDLIN F, 1962, Patent No. 3024140

[80] SYNTHESE UND UMWANDLUNGSPRODUKTE DES ACROLEINS [J]. ANGEWANDTE CHEMIE, 1950, 62 (05): : 105 - 118