DOPANT-INDUCED ABLATION OF POLY(METHYL METHACRYLATE) BY A 308-NM EXCIMER LASER

被引：60

作者：

MASUHARA, H ^{[1
]}

HIRAOKA, H ^{[1
]}

DOMEN, K ^{[1
]}

机构：

[1] IBM RES,ALMADEN RES CTR,SAN JOSE,CA 95120

来源：

MACROMOLECULES | 1987年 / 20卷 / 02期

关键词：

D O I：

10.1021/ma00168a044

中图分类号：

O63 [高分子化学（高聚物）];

学科分类号：

070305 ; 080501 ; 081704 ;

摘要：

引用

页码：450 / 452

页数：3

共 13 条

[1] DIRECT ETCHING OF POLYMERIC MATERIALS USING A XECL LASER
ANDREW, JE
DYER, PE
FORSTER, D
KEY, PH
[J]. APPLIED PHYSICS LETTERS, 1983, 43 (08) : 717 - 719
[2] DEPENDENCE OF PHOTOETCHING RATES OF POLYMERS AT 193 NM ON OPTICAL-ABSORPTION DEPTH
COLE, HS
LIU, YS
PHILIPP, HR
[J]. APPLIED PHYSICS LETTERS, 1986, 48 (01) : 76 - 77
[3] HIGH-TEMPERATURE FLOW RESISTANCE OF MICRON SIZED IMAGES IN AZ RESISTS
HIRAOKA, H
PACANSKY, J
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1981, 128 (12) : 2645 - 2647
[4] EMISSION-SPECTRA AND ETCHING OF POLYMERS AND GRAPHITE IRRADIATED BY EXCIMER LASERS
KOREN, G
YEH, JTC
[J]. JOURNAL OF APPLIED PHYSICS, 1984, 56 (07) : 2120 - 2126
[5] LINSKER R, 1984, LASERS SURG MED, V4, P2
[6] MECHANISM OF THE ULTRAVIOLET-LASER ABLATION OF POLY(METHYL METHACRYLATE AT 193 AND 248 NM - LASER-INDUCED FLUORESCENCE ANALYSIS, CHEMICAL-ANALYSIS, AND DOPING STUDIES
SRINIVASAN, R
BRAREN, B
DREYFUS, RW
HADEL, L
SEEGER, DE
[J]. JOURNAL OF THE OPTICAL SOCIETY OF AMERICA B-OPTICAL PHYSICS, 1986, 3 (05) : 785 - 791
[7] ABLATIVE PHOTODECOMPOSITION OF POLYMER-FILMS BY PULSED FAR-ULTRAVIOLET (193 NM) LASER-RADIATION - DEPENDENCE OF ETCH DEPTH ON EXPERIMENTAL CONDITIONS
SRINIVASAN, R
BRAREN, B
[J]. JOURNAL OF POLYMER SCIENCE PART A-POLYMER CHEMISTRY, 1984, 22 (10) : 2601 - 2609
[8] PHOTOCHEMICAL CLEAVAGE OF A POLYMERIC SOLID - DETAILS OF THE ULTRAVIOLET-LASER ABLATION OF POLY(METHYL METHACRYLATE) AT 193-NM AND 248-NM
SRINIVASAN, R
BRAREN, B
SEEGER, DE
DREYFUS, RW
[J]. MACROMOLECULES, 1986, 19 (03) : 916 - 921
[9] KINETICS OF THE ABLATIVE PHOTO-DECOMPOSITION OF ORGANIC POLYMERS IN THE FAR ULTRAVIOLET (193 NM)
SRINIVASAN, R
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1983, 1 (04): : 923 - 926
[10] SELF-DEVELOPING PHOTOETCHING OF POLY(ETHYLENE-TEREPHTHALATE) FILMS BY FAR ULTRAVIOLET EXCIMER LASER-RADIATION
SRINIVASAN, R
MAYNEBANTON, V
[J]. APPLIED PHYSICS LETTERS, 1982, 41 (06) : 576 - 578

← 1 2 →