PROPERTIES OF RF-SPUTTERED ITO FILMS ON SUBSTRATES ABOVE AND BELOW THE VIRTUAL SOURCE

被引：23

作者：

MANSINGH, A

KUMAR, CVRV

机构：

来源：

JOURNAL OF PHYSICS D-APPLIED PHYSICS | 1989年 / 22卷 / 03期

关键词：

D O I：

10.1088/0022-3727/22/3/013

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：455 / 457

页数：3

共 15 条

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