VMOS RELIABILITY

被引:6
作者
EDWARDS, JR
BHATTI, IS
FULLER, E
机构
[1] American Microsystems, Inc, Santa Clara
关键词
D O I
10.1109/T-ED.1979.19377
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Whenever a new technology such as VMOS emerges, one key element to its success is the reliability of the products manufactured in that technology. The results of a reliability study to examine the fundamental VMOS device stability, high-temperature operating life (HTOL) failure rates, and electrostatic protection are presented for the VMOS technology. Experimental data for more than five (5) million device-hours of HTOL predict a reliability failure rate of less than 0.01 percent/1000 h at 70°C for products fabricated in the VMOS technology. In addition, an electrostatic protection capability greater than 1800 V is possible with specially designed VMOS input protection devices. Copyright © 1979 by The Institute of Electrical and Electronics Engineers, Inc.
引用
收藏
页码:43 / 48
页数:6
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