REACTIVE COSPUTTERING OF OXIDES AND NITRIDES USING A C-MAGTM ROTATABLE CYLINDRICAL CATHODE

被引：8

作者：

BELKIND, A ^{[1
]}

GERRISTEAD, W ^{[1
]}

ORBAN, Z ^{[1
]}

DOW, D ^{[1
]}

FELTS, J ^{[1
]}

LAIRD, R ^{[1
]}

机构：

[1] AIRCO COATING TECHNOL,CONCORD,CA 94524

来源：

SURFACE & COATINGS TECHNOLOGY | 1991年 / 49卷 / 1-3期

关键词：

D O I：

10.1016/0257-8972(91)90048-2

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

The development of large-area in-line deposition technology of mixed oxide and nitride films is reviewed. Co-sputtering using C-Mag(tm) rotatable cylindrical cathodes and different magnet angles is analyzed. The deposition rate, composition and physical properties of the films as a function of the substrate position along its movement direction are presented. The deposition results of some mixed oxides and nitrides prepared by co-sputtering from different pairs of elemental targets are reviewed.

引用

页码：155 / 160

页数：6

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