XPS ANALYSIS OF THERMALLY GROWN OXIDE FILM ON GAP

被引：42

作者：

NISHITANI, R ^{[1
]}

IWASAKI, H ^{[1
]}

MIZOKAWA, Y ^{[1
]}

NAKAMURA, S ^{[1
]}

机构：

[1] UNIV OSAKA PREFECTURE,JR COLL ENGN,IKUNO,OSAKA,JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS | 1978年 / 17卷 / 02期

关键词：

D O I：

10.1143/JJAP.17.321

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：321 / 327

页数：7

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