HIGHLY SELECTIVE REACTIVE ION ETCHING OF POLYSILICON WITH HYDROGEN BROMIDE

被引：27

作者：

TSOU, LY

机构：

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1989年 / 136卷 / 10期

关键词：

D O I：

10.1149/1.2096391

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

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页码：3003 / 3006

页数：4

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