EFFECT OF PHOTORESIST ON PLASMA-ETCHING

被引：12

作者：

TSOU, LY

机构：

来源：

关键词：

D O I：

10.1149/1.2097354

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：2354 / 2356

页数：3

共 9 条

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