ANISOTROPIC-PLASMA ETCHING OF POLYSILICON

被引：176

作者：

MOGAB, CJ

LEVINSTEIN, HJ

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1980年 / 17卷 / 03期

关键词：

D O I：

10.1116/1.570549

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：721 / 730

页数：10

共 13 条

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