PRECISION ABSOLUTE THIN-FILM STANDARD REFERENCE TARGETS FOR RUTHERFORD BACKSCATTERING MICROANALYSIS

被引：29

作者：

RIGO, S ^{[1
]}

COHEN, C ^{[1
]}

LHOIR, A ^{[1
]}

BACKELANDT, E ^{[1
]}

机构：

[1] THOMSON CSF,CENT RES LAB,F-91401 ORSAY,FRANCE

来源：

NUCLEAR INSTRUMENTS & METHODS | 1978年 / 149卷 / 1-3期

关键词：

D O I：

10.1016/0029-554X(78)90958-8

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

引用

页码：721 / 726

页数：6

共 15 条

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[2] PRECISION ABSOLUTE THIN-FILM STANDARD REFERENCE TARGETS FOR NUCLEAR-REACTION MICROANALYSIS OF OXYGEN ISOTOPES .1. O-16 STANDARDS
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[3] 7ICROANALYSIS BY DIRECT OBSERVATION OF NUCLEAR REACTIONS USING A 2 MEV VAN-DE-GRAAFF
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[4] AMSEL G, 1964, ANN PHYS-PARIS, V9, P297
[5] PREPARATION AND PROPERTIES OF TANTALUM THIN-FILMS
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[J]. THIN SOLID FILMS, 1972, 14 (01) : 3 - 25
[6] STUDY OF COMPETITIVE DIFFUSION AT 525 DEGRESS C OF NITROGEN AND OXYGEN IN SPUTTERED BETA-TANTALUM FILMS
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[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1972, 9 (01): : 165 - &
[7] CROSET M, 1971, P ELECTROCHEM SOC M, P435
[8] FORMATION OF ULTRATHIN OXIDE-FILMS ON SILICON
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[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1972, 119 (12) : 1723 - +
[9] KOFSTADT P, 1966, HIGH TEMPERATURE OXI
[10] L'hoir A., 1976, ION BEAM SURFACE LAY, P965