PREPARATION AND PROPERTIES OF TANTALUM THIN-FILMS

[1] ADAMOV M, 1972, INT C THIN FILMS VEN

[2] ALTMAN C, 1962, 9 T NAT VAC S, P174

[3] [Anonymous], 1958, HDB LATTICE SPACINGS

[4] RF SPUTTERED TANTALUM FILMS DEPOSITED IN AN OXYGEN DOPED ATMOSPHERE [J]. THIN SOLID FILMS, 1970, 6 (05) : R57 - &

[5] BERRY RW, 1968, THIN FILM TECHNOLOGY, pCH10

[6] BERRY RW, 1968, THIN FILM TECHNOLOGY, pCH9

[7] A SIMPLE APPARATUS FOR DC BIAS SPUTTERING [J]. VACUUM, 1970, 20 (07) : 285 - &

[8] BROWN R, 1966, AM CERAM SOC BULL, V45, P720

[9] BROWN R, 1969, PROGRESS ANALYTICAL, V2

[10] BUVINGER EA, 1966, 6 INT C EL MICR MAR, P511

[1] ADAMOV M, 1972, INT C THIN FILMS VEN

[2] ALTMAN C, 1962, 9 T NAT VAC S, P174

[3] [Anonymous], 1958, HDB LATTICE SPACINGS

[4] RF SPUTTERED TANTALUM FILMS DEPOSITED IN AN OXYGEN DOPED ATMOSPHERE [J]. THIN SOLID FILMS, 1970, 6 (05) : R57 - &

[5] BERRY RW, 1968, THIN FILM TECHNOLOGY, pCH10

[6] BERRY RW, 1968, THIN FILM TECHNOLOGY, pCH9

[7] A SIMPLE APPARATUS FOR DC BIAS SPUTTERING [J]. VACUUM, 1970, 20 (07) : 285 - &

[8] BROWN R, 1966, AM CERAM SOC BULL, V45, P720

[9] BROWN R, 1969, PROGRESS ANALYTICAL, V2

[10] BUVINGER EA, 1966, 6 INT C EL MICR MAR, P511