TRAPPING LEVELS IN SILICON NITRIDE

被引:10
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KENDALL, EJM
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D O I
10.1049/el:19680365
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TM [电工技术]; TN [电子技术、通信技术];
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0808 ; 0809 ;
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页码:468 / &
相关论文
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[4]  
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[5]   EVIDENCE OF HOLE INJECTION AND TRAPPING IN SILICON NITRIDE FILMS PREPARED BY REACTIVE SPUTTERING [J].
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GREGOR, LV .
APPLIED PHYSICS LETTERS, 1967, 10 (03) :97-&
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KENDALL EJM, TO BE PUBLISHED
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KENDALL EJM, 1968, BRIT J APPL PHYS, V1, P1303