CHARACTERIZATION OF THERMALLY-INDUCED DEFECTS IN CZ-SI BY ROOM-TEMPERATURE PHOTO-LUMINESCENCE

被引:6
作者
KATSURA, J
NAKAYAMA, H
NISHINO, T
HAMAKAWA, Y
机构
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1982年 / 21卷 / 05期
关键词
D O I
10.1143/JJAP.21.712
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:712 / 715
页数:4
相关论文
共 14 条
[1]   INHOMOGENEOUS OXYGEN PRECIPITATION AND STACKING-FAULT FORMATION IN CZOCHRALSKI SILICON [J].
INOUE, N ;
OOSAKA, J .
JAPANESE JOURNAL OF APPLIED PHYSICS, 1978, 17 (11) :2051-2052
[2]  
INOUE N, 1981, SEMICONDUCTOR SILICO, P282
[3]  
JENKINS MW, 1977, J ELECTROCHEM SOC, V124, P757, DOI 10.1149/1.2133401
[4]   MODEL FOR FORMATION OF STACKING-FAULTS IN SILICON [J].
MAHAJAN, S ;
ROZGONYI, GA ;
BRASEN, D .
APPLIED PHYSICS LETTERS, 1977, 30 (02) :73-75
[5]   PHOTO-LUMINESCENCE OBSERVATION OF SWIRL DEFECTS AND GETTERING EFFECTS IN SILICON AT ROOM-TEMPERATURE [J].
NAKASHIMA, H ;
SHIRAKI, Y .
APPLIED PHYSICS LETTERS, 1978, 33 (03) :257-258
[6]   HALL-EFFECT AND PHOTO-LUMINESCENCE MEASUREMENTS OF OXYGEN-RELATED DONORS IN CZ-SI CRYSTALS [J].
NAKAYAMA, H ;
KATSURA, J ;
NISHINO, T ;
HAMAKAWA, Y .
JAPANESE JOURNAL OF APPLIED PHYSICS, 1980, 19 (09) :L547-L550
[7]   A NEW PHOTO-LUMINESCENCE METHOD OF CHARACTERIZING THE IN-DEPTH PROFILE OF THERMALLY INDUCED DEFECTS IN CZ-SI [J].
NAKAYAMA, H ;
KATSURA, J ;
NISHINO, T ;
HAMAKAWA, Y .
JAPANESE JOURNAL OF APPLIED PHYSICS, 1982, 21 (01) :127-134
[8]   LUMINESCENCE OF THERMALLY INDUCED DEFECTS IN SI CRYSTALS [J].
NAKAYAMA, H ;
NISHINO, T ;
HAMAKAWA, Y .
APPLIED PHYSICS LETTERS, 1981, 38 (08) :623-625
[9]   THERMALLY INDUCED LUMINESCENT CENTERS IN CZOCHRALSKI-GROWN SILICON-CRYSTALS [J].
NAKAYAMA, H ;
KATSURA, J ;
NISHINO, T ;
HAMAKAWA, Y .
JOURNAL OF LUMINESCENCE, 1981, 24-5 (NOV) :35-38
[10]  
NAKAYAMA H, 1981, 13TH P C SOL STAT DE