Stacking-Faults in Tellurium-Doped Gallium Arsenide

被引:37
作者
Laister, D. [1 ]
Jenkins, G. M. [1 ]
机构
[1] Univ Coll, Dept Met, Swansea, Glam, Wales
关键词
D O I
10.1007/BF00757903
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Samples of bulk-grown gallium arsenide single crystals, taken from both static freeze, and Czochralski ingots doped to a high level with tellurium, have been examined using transmission electron microscopy. Observation of single and multiple stacking-fault layers which have fault vectors of the kind R = a/3 < 111 > is reported. It is shown by diffraction contrast experiments that the stacking-fault defects are extrinsic. They are thought to be rafts of tellurium substituting for arsenic in {1 1 1} planes. The prevalence of the observed layer defects correlates well with the increase in carrier concentration in certain regions of the crystals.
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页码:584 / 589
页数:6
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