STUDIES OF THE SPUTTER DEPOSITION OF CARBON, SILICON AND SIC FILMS

被引：25

作者：

SATHYAMOORTHY, A ^{[1
]}

WEISWEILER, W ^{[1
]}

机构：

[1] UNIV KARLSRUHE,INST CHEM TECH,D-7500 KARLSRUHE,FED REP GER

来源：

THIN SOLID FILMS | 1982年 / 87卷 / 01期

关键词：

D O I：

10.1016/0040-6090(82)90568-5

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：33 / 42

页数：10

共 17 条

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[8]

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[10] FORMATION OF 2H-TYPE SIC FILMS BY REACTIVE SPUTTERING [J].

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