FORMATION OF 2H-TYPE SIC FILMS BY REACTIVE SPUTTERING

被引：8

作者：

MATSUMOTO, S

SUZUKI, H

UEDA, R

机构：

来源：

关键词：

D O I：

10.1143/JJAP.11.607

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：607 / +

页数：1

共 9 条

[1]

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[2]

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[3]

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[5]

Knippenberg WF., 1963, PHILIPS RES REP, V18, P161

[6] LOW-TEMPERATURE EPITAXY OF BETA-SIC BY REACTIVE DEPOSITION [J].

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HAQ, KE .

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KHAN, IH .

[8] REACTIVE DEPOSITION OF CUBIC SILICON CARBIDE [J].

LEARN, AJ ;

HAQ, KE .

[9] SILICON CARBIDE FILMS EVAPORATED IN VACUUM ON SYNTHETIC MICAS [J].

ONUMA, Y .