ANALYSIS OF MARKER MOTION IN THIN-FILM SILICIDE FORMATION

被引：32

作者：

TU, KN ^{[1
]}

机构：

[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598

来源：

JOURNAL OF APPLIED PHYSICS | 1977年 / 48卷 / 08期

关键词：

D O I：

10.1063/1.324178

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：3379 / 3382

页数：4

共 20 条

[1]

Bardeen J., 1951, ATOM MOVEMENTS, P87

[2] INTERDIFFUSION IN A BULK COUPLE OF LEAD AND LEAD 50 WTPERCENT INDIUM ALLOY [J].

CAMPBELL, DR ;

TU, KN ;

ROBINSON, RE .

ACTA METALLURGICA, 1976, 24 (07) :609-614

[3] IDENTIFICATION OF DOMINANT DIFFUSING SPECIES IN SILICIDE FORMATION [J].

CHU, WK ;

KRAUTLE, H ;

MAYER, JW ;

MULLER, H ;

NICOLET, MA ;

TU, KN .

APPLIED PHYSICS LETTERS, 1974, 25 (08) :454-457

[4] IMPLANTED NOBLE-GAS ATOMS AS DIFFUSION MARKERS IN SILICIDE FORMATION [J].

CHU, WK ;

LAU, SS ;

MAYER, JW ;

MULLER, H .

THIN SOLID FILMS, 1975, 25 (02) :393-402

[5]

CORREADASILVA LC, 1951, T AM I MIN MET ENG, V191, P155

[6]

DARKEN LS, 1948, T AM I MIN MET ENG, V175, P184

[7] SOME ASPECTS OF THE GROWTH OF DIFFUSION LAYERS IN BINARY SYSTEMS [J].

KIDSON, GV .

JOURNAL OF NUCLEAR MATERIALS, 1961, 3 (01) :21-29

[8]

Kirkendall EO, 1942, T AM I MIN MET ENG, V147, P104

[9]

LAZARUS D, 1960, SOLID STATE PHYS, V10, P71

[10] DIFFUSION IN METALS [J].

LECLAIRE, AD .

PROGRESS IN METAL PHYSICS, 1953, 4 :265-332

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