PREPARATION AND PROPERTIES OF VAPOR-PHASE EPITAXIAL SILICON-CARBIDE DIODES

被引:11
作者
GRAMBERG, G
KONIGER, M
机构
关键词
D O I
10.1016/0038-1101(72)90083-4
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:285 / +
页数:1
相关论文
共 22 条
[1]   X-RAY METHOD FOR DETERMINATION OF POLARITY OF SIC CRYSTALS [J].
BRACK, K .
JOURNAL OF APPLIED PHYSICS, 1965, 36 (11) :3560-&
[2]   SOLUTION GROWN SIC P-N JUNCTIONS [J].
BRANDER, RW ;
SUTTON, RP .
JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1969, 2 (03) :309-&
[3]   ETCHING OF ALPHA-SILICON CARBIDE [J].
BRANDER, RW ;
BOUGHEY, AL .
BRITISH JOURNAL OF APPLIED PHYSICS, 1967, 18 (07) :905-&
[4]  
CHOYKE WJ, 1969, MAT RES B, V4, P141
[5]   CHEMICAL ETCHING OF SILICON CARBIDE WITH HYDROGEN [J].
CHU, TL ;
CAMPBELL, RB .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1965, 112 (09) :955-&
[6]   TEMPERATURE DEPENDENCE OF SPACE CHARGE CAPACITANCE OF SILICON CARBIDE DIODES [J].
GRAMBERG, G .
SOLID-STATE ELECTRONICS, 1971, 14 (11) :1067-+
[7]  
GREEBE CAA, 1963, PHILIPS RES REP S1
[8]   GROWTH OF ALPHA-SIC SINGLE CRYSTALS FROM CHROMIUM SOLUTION [J].
GRIFFITHS, LB ;
MLAVSKY, AI .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1964, 111 (07) :805-810
[9]   ELECTROLESS NICKEL PLATING ON SILICON [J].
IWASA, H ;
YOKOZAWA, M ;
TERAMOTO, I .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1968, 115 (05) :485-&
[10]  
KHOLUYANOV GF, 1969, SOV PHYS SEMICOND+, V3, P560