POTENTIAL STRUCTURE IN SILANE RADIOFREQUENCY DISCHARGE CONTAINING PARTICLES

被引：8

作者：

OKUNO, Y ^{[1
]}

FUJITA, H ^{[1
]}

SHIRATANI, M ^{[1
]}

WATANABE, Y ^{[1
]}

机构：

[1] KYUSHU UNIV,DEPT ELECT ENGN,FUKUOKA 812,JAPAN

来源：

APPLIED PHYSICS LETTERS | 1993年 / 63卷 / 13期

关键词：

D O I：

10.1063/1.110702

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Potential structures are clarified experimentally with an emissive probe in silane-helium radio-frequency (rf) discharges containing particles. The results reveal, compared with a pure helium rf discharge, that both the crest and trough instantaneous plasma potentials in an rf oscillation shift toward the negative side, especially in the particle localized region near the plasma-sheath boundary. The absolute value of the self-bias potential of the powered electrode is reduced. A considerable electric field exists even in the bulk plasma region and the strength increases with the concentration ratio of silane to helium.

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页码：1748 / 1750

页数：3

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