共 15 条
[1]
ELECTRON-CYCLOTRON RESONANCE MICROWAVE DISCHARGES FOR ETCHING AND THIN-FILM DEPOSITION
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS,
1989, 7 (03)
:883-893
[2]
THE EXPERIMENTAL TEST OF A MICROWAVE ION-BEAM SOURCE IN OXYGEN
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B,
1987, 5 (01)
:328-331
[3]
PLASMA-ETCHING OF III-V SEMICONDUCTORS IN CH4/H2/AR ELECTRON-CYCLOTRON RESONANCE DISCHARGES
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B,
1990, 8 (04)
:596-606
[4]
ALLNAS/INGAAS BASED HETEROJUNCTION BIPOLAR-TRANSISTORS FABRICATED BY ELECTRON-CYCLOTRON RESONANCE ETCH
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B,
1991, 9 (03)
:1445-1448
[6]
CHARGED-PARTICLE DENSITIES AND ENERGY-DISTRIBUTIONS IN A MULTIPOLAR ELECTRON-CYCLOTRON RESONANT PLASMA-ETCHING SOURCE
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS,
1990, 8 (04)
:3103-3112
[7]
HOPWOOD J, 1990, THESIS MICHIGAN STAT
[9]
INVESTIGATION OF THE INFLUENCE OF ELECTROMAGNETIC-EXCITATION ON ELECTRON-CYCLOTRON RESONANCE DISCHARGE PROPERTIES
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS,
1992, 10 (04)
:1281-1287
[10]
MAGNETIC-FIELD GRADIENT EFFECTS ON ION ENERGY FOR ELECTRON-CYCLOTRON RESONANCE MICROWAVE PLASMA STREAM
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A,
1988, 6 (01)
:25-29