DOPANT REDISTRIBUTION IN SILICIDE SILICON AND SILICIDE POLYCRYSTALLINE SILICON BILAYERED STRUCTURES

被引：63

作者：

MURARKA, SP ^{[1
]}

WILLIAMS, DS ^{[1
]}

机构：

[1] AT&T BELL LABS,MURRAY HILL,NJ 07974

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1987年 / 5卷 / 06期

关键词：

D O I：

10.1116/1.583648

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：1674 / 1688

页数：15

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