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A NEW PUNCHTHROUGH CURRENT MODEL BASED ON THE VOLTAGE-DOPING TRANSFORMATION
被引:13
作者
:
SKOTNICKI, T
论文数:
0
引用数:
0
h-index:
0
机构:
ITE CEMI,WARSAW,POLAND
ITE CEMI,WARSAW,POLAND
SKOTNICKI, T
[
1
]
MERCKEL, G
论文数:
0
引用数:
0
h-index:
0
机构:
ITE CEMI,WARSAW,POLAND
ITE CEMI,WARSAW,POLAND
MERCKEL, G
[
1
]
PEDRON, T
论文数:
0
引用数:
0
h-index:
0
机构:
ITE CEMI,WARSAW,POLAND
ITE CEMI,WARSAW,POLAND
PEDRON, T
[
1
]
机构
:
[1]
ITE CEMI,WARSAW,POLAND
来源
:
IEEE TRANSACTIONS ON ELECTRON DEVICES
|
1988年
/ 35卷
/ 07期
关键词
:
D O I
:
10.1109/16.3367
中图分类号
:
TM [电工技术];
TN [电子技术、通信技术];
学科分类号
:
0808 ;
0809 ;
摘要
:
16
引用
收藏
页码:1076 / 1086
页数:11
相关论文
共 16 条
[11]
A NEW APPROACH TO THRESHOLD VOLTAGE MODELING OF SHORT-CHANNEL MOSFETS
[J].
SKOTNICKI, T
论文数:
0
引用数:
0
h-index:
0
机构:
INST ELECTRON TECHNOL CEMI,PL-02668 WARSAW,POLAND
INST ELECTRON TECHNOL CEMI,PL-02668 WARSAW,POLAND
SKOTNICKI, T
;
MARCINIAK, W
论文数:
0
引用数:
0
h-index:
0
机构:
INST ELECTRON TECHNOL CEMI,PL-02668 WARSAW,POLAND
INST ELECTRON TECHNOL CEMI,PL-02668 WARSAW,POLAND
MARCINIAK, W
.
SOLID-STATE ELECTRONICS,
1986,
29
(11)
:1115
-1127
[12]
SKOTNICKI T, 1985, THESIS I ELECTRON TE
[13]
SUB-THRESHOLD CONDUCTION IN MOSFETS
[J].
TAYLOR, GW
论文数:
0
引用数:
0
h-index:
0
TAYLOR, GW
.
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1978,
25
(03)
:337
-350
[14]
ANALYTICAL MODELS OF THRESHOLD VOLTAGE AND BREAKDOWN VOLTAGE OF SHORT-CHANNEL MOSFETS DERIVED FROM 2-DIMENSIONAL ANALYSIS
[J].
TOYABE, T
论文数:
0
引用数:
0
h-index:
0
机构:
Central Research Laboratory, Hitachi, Ltd., Kokubunji
TOYABE, T
;
ASAI, S
论文数:
0
引用数:
0
h-index:
0
机构:
Central Research Laboratory, Hitachi, Ltd., Kokubunji
ASAI, S
.
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1979,
26
(04)
:453
-461
[15]
VLSI LIMITATIONS FROM DRAIN-INDUCED BARRIER LOWERING
[J].
TROUTMAN, RR
论文数:
0
引用数:
0
h-index:
0
机构:
IBM General Technology Division, Essex Junction
TROUTMAN, RR
.
IEEE JOURNAL OF SOLID-STATE CIRCUITS,
1979,
14
(02)
:383
-391
[16]
ION-IMPLANTED THRESHOLD TAILORING FOR INSULATED GATE FIELD-EFFECT TRANSISTORS
[J].
TROUTMAN, RR
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,DIV SYST PROD,ESSEX JUNCTION,VT 05452
IBM CORP,DIV SYST PROD,ESSEX JUNCTION,VT 05452
TROUTMAN, RR
.
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1977,
24
(03)
:182
-192
←
1
2
→
共 16 条
[11]
A NEW APPROACH TO THRESHOLD VOLTAGE MODELING OF SHORT-CHANNEL MOSFETS
[J].
SKOTNICKI, T
论文数:
0
引用数:
0
h-index:
0
机构:
INST ELECTRON TECHNOL CEMI,PL-02668 WARSAW,POLAND
INST ELECTRON TECHNOL CEMI,PL-02668 WARSAW,POLAND
SKOTNICKI, T
;
MARCINIAK, W
论文数:
0
引用数:
0
h-index:
0
机构:
INST ELECTRON TECHNOL CEMI,PL-02668 WARSAW,POLAND
INST ELECTRON TECHNOL CEMI,PL-02668 WARSAW,POLAND
MARCINIAK, W
.
SOLID-STATE ELECTRONICS,
1986,
29
(11)
:1115
-1127
[12]
SKOTNICKI T, 1985, THESIS I ELECTRON TE
[13]
SUB-THRESHOLD CONDUCTION IN MOSFETS
[J].
TAYLOR, GW
论文数:
0
引用数:
0
h-index:
0
TAYLOR, GW
.
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1978,
25
(03)
:337
-350
[14]
ANALYTICAL MODELS OF THRESHOLD VOLTAGE AND BREAKDOWN VOLTAGE OF SHORT-CHANNEL MOSFETS DERIVED FROM 2-DIMENSIONAL ANALYSIS
[J].
TOYABE, T
论文数:
0
引用数:
0
h-index:
0
机构:
Central Research Laboratory, Hitachi, Ltd., Kokubunji
TOYABE, T
;
ASAI, S
论文数:
0
引用数:
0
h-index:
0
机构:
Central Research Laboratory, Hitachi, Ltd., Kokubunji
ASAI, S
.
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1979,
26
(04)
:453
-461
[15]
VLSI LIMITATIONS FROM DRAIN-INDUCED BARRIER LOWERING
[J].
TROUTMAN, RR
论文数:
0
引用数:
0
h-index:
0
机构:
IBM General Technology Division, Essex Junction
TROUTMAN, RR
.
IEEE JOURNAL OF SOLID-STATE CIRCUITS,
1979,
14
(02)
:383
-391
[16]
ION-IMPLANTED THRESHOLD TAILORING FOR INSULATED GATE FIELD-EFFECT TRANSISTORS
[J].
TROUTMAN, RR
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,DIV SYST PROD,ESSEX JUNCTION,VT 05452
IBM CORP,DIV SYST PROD,ESSEX JUNCTION,VT 05452
TROUTMAN, RR
.
IEEE TRANSACTIONS ON ELECTRON DEVICES,
1977,
24
(03)
:182
-192
←
1
2
→