DECREASE IN THE ETCH RATE OF POLYMERS IN THE OXYGEN AFTERGLOW WITH INCREASING GAS-FLOW RATE

被引：9

作者：

LERNER, NR

WYDEVEN, T

机构：

[1] NASA, Moffett Field, CA, USA, NASA, Moffett Field, CA, USA

来源：

JOURNAL OF APPLIED POLYMER SCIENCE | 1988年 / 35卷 / 07期

关键词：

D O I：

10.1002/app.1988.070350715

中图分类号：

O63 [高分子化学（高聚物）];

学科分类号：

070305 ; 080501 ; 081704 ;

摘要：

引用

页码：1903 / 1908

页数：6

共 11 条

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[4]

HUIE RE, 1975, PROG REACT KINET, V8, P1

[5]

KAUFMAN R, 1960, 8TH S INT COMB BALT, P230

[6]

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[9] RESIST MATERIALS UTILIZING OXYGEN PLASMA RESISTANCE OF IODINE COMPOUNDS [J].

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JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1985, 132 (05) :1168-1171

[10] EFFECT OF ELECTRODELESS GLOW-DISCHARGE ON POLYMERS [J].

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