RESIST MATERIALS UTILIZING OXYGEN PLASMA RESISTANCE OF IODINE COMPOUNDS

被引：16

作者：

UENO, T

SHIRAISHI, H

IWAYANAGI, T

NONOGAKI, S

机构：

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1985年 / 132卷 / 05期

关键词：

D O I：

10.1149/1.2114052

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：1168 / 1171

页数：4

共 9 条

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[9] INSOLUBILIZATION MECHANISM AND LITHOGRAPHIC CHARACTERISTICS OF A NEGATIVE ELECTRON-BEAM RESIST IODINATED POLYSTYRENE [J].

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