INSOLUBILIZATION MECHANISM AND LITHOGRAPHIC CHARACTERISTICS OF A NEGATIVE ELECTRON-BEAM RESIST IODINATED POLYSTYRENE

被引：7

作者：

UENO, T

SHIRAISHI, H

NONOGAKI, S

机构：

来源：

JOURNAL OF APPLIED POLYMER SCIENCE | 1984年 / 29卷 / 01期

关键词：

D O I：

10.1002/app.1984.070290121

中图分类号：

O63 [高分子化学（高聚物）];

学科分类号：

070305 ; 080501 ; 081704 ;

摘要：

引用

页码：223 / 235

页数：13

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