ATOMIC-STRUCTURE OF AMORPHOUS SI1-XCX FILMS PREPARED BY RF SPUTTERING

被引：11

作者：

SUZAKI, Y

INOUE, S

HASEGAWA, I

YOSHII, K

KAWABE, H

机构：

来源：

THIN SOLID FILMS | 1989年 / 173卷 / 02期

关键词：

D O I：

10.1016/0040-6090(89)90139-9

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：235 / 242

页数：8

共 22 条

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