AN NBS STANDARD REFERENCE MATERIAL FOR DEPTH PROFILE ANALYSIS

被引：12

作者：

FINE, J ^{[1
]}

NAVINSEK, B ^{[1
]}

机构：

[1] JOZEF STEFAN INST,YU-6100 LJUBLJANA,YUGOSLAVIA

来源：

SURFACE AND INTERFACE ANALYSIS | 1988年 / 11卷 / 10期

关键词：

MEASUREMENTS - Standards - NICKEL CHROMIUM ALLOYS;

D O I：

10.1002/sia.740111010

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

A periodically modulated thin-film material, specifically developed for calibrating sputtered depths and erosion rates, is available from NBS. Information on its structure and characterization is summarized.

引用

页码：542 / 543

页数：2

共 5 条

[1] INTERFACE DEPTH RESOLUTION OF AUGER SPUTTER PROFILED NI/CR INTERFACES - DEPENDENCE ON ION-BOMBARDMENT PARAMETERS
FINE, J
LINDFORS, PA
GORMAN, ME
GERLACH, RL
NAVINSEK, B
MITCHELL, DF
CHAMBERS, GP
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 1985, 3 (03): : 1413 - 1417
[2] CHARACTERIZATION OF NBS STANDARD REFERENCE MATERIAL 2135 FOR SPUTTER DEPTH PROFILE ANALYSIS
FINE, J
NAVINSEK, B
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 1985, 3 (03): : 1408 - 1412
[3] AES AND XPS DEPTH PROFILING CERTIFIED REFERENCE MATERIAL
HUNT, CP
ANTHONY, MT
SEAH, MP
[J]. SURFACE AND INTERFACE ANALYSIS, 1984, 6 (02) : 92 - 93
[4] SPUTTER DEPOSITION OF MULTILAYERED STRUCTURES FOR USE IN SPUTTER DEPTH PROFILE CALIBRATION
NAVINSEK, B
FINE, J
[J]. VACUUM, 1986, 36 (10) : 711 - 714
[5] SIMONS G, 1983, NUCL INSTRUM METHODS, V218, P585

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