INTERFACE DEPTH RESOLUTION OF AUGER SPUTTER PROFILED NI/CR INTERFACES - DEPENDENCE ON ION-BOMBARDMENT PARAMETERS

被引：57

作者：

FINE, J

LINDFORS, PA

GORMAN, ME

GERLACH, RL

NAVINSEK, B

MITCHELL, DF

CHAMBERS, GP

机构：

[1] PERKIN ELMER CORP, DIV PHYS ELECTR, EDEN PRAIRIE, MN 55344 USA

[2] EDVARD KARDELJ UNIV, INST JOZEF STEFAN, YU-61000 LJUBLJANA, YUGOSLAVIA

[3] NATL RES COUNCIL CANADA, OTTAWA K1A 0R9, ONTARIO, CANADA

[4] UNIV MARYLAND, DEPT CHEM & NUCL ENGN, COLLEGE PK, MD 20742 USA

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A | 1985年 / 3卷 / 03期

关键词：

D O I：

10.1116/1.572791

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：1413 / 1417

页数：5

共 31 条

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