EFFECTS OF ENHANCED DIFFUSION ON PREFERRED SPUTTERING OF HOMOGENEOUS ALLOY SURFACES

被引：149

作者：

HO, PS

机构：

来源：

关键词：

D O I：

10.1016/0039-6028(78)90294-7

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

页码：253 / 263

页数：11

共 16 条

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[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1977, 14 (01): : 322 - 325
[7] HO PT, UNPUBLISHED
[8] INFLUENCE OF SPUTTERING AND TRANSPORT MECHANISMS ON TARGET ETCHING AND THIN-FILM GROWTH IN RF SYSTEMS .1. TARGET PROCESSES
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