CHARACTERIZATION OF NBS STANDARD REFERENCE MATERIAL 2135 FOR SPUTTER DEPTH PROFILE ANALYSIS

被引:48
作者
FINE, J [1 ]
NAVINSEK, B [1 ]
机构
[1] EDVARD KARDELJ UNIV, INST JOZEF STEFAN, YU-61000 LJUBLJANA, YUGOSLAVIA
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A | 1985年 / 3卷 / 03期
关键词
D O I
10.1116/1.572790
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
引用
收藏
页码:1408 / 1412
页数:5
相关论文
共 34 条
  • [1] Andersen H. H., 1981, Sputtering by particle bombardment I. Physical sputtering of single-element solids, P145
  • [2] DEPTH RESOLUTION OF SPUTTER PROFILING
    ANDERSEN, HH
    [J]. APPLIED PHYSICS, 1979, 18 (02): : 131 - 140
  • [3] BARR TL, 1980, APPLIED SURFACE ANAL
  • [4] Behrisch, 1983, SPUTTERING PARTICLE, V52
  • [5] Behrisch R., 1981, SPUTTERING PARTICLE, V1
  • [6] Briggs D., 1983, PRACTICAL SURFACE AN
  • [7] BASIC ASSUMPTIONS AND RECENT DEVELOPMENTS IN QUANTITATIVE XPS
    CARLSON, TA
    [J]. SURFACE AND INTERFACE ANALYSIS, 1982, 4 (04) : 125 - 134
  • [8] THEORETICAL ASSESSMENTS OF MAJOR PHYSICAL PROCESSES INVOLVED IN THE DEPTH RESOLUTION IN SPUTTER PROFILING
    CARTER, G
    GRASMARTI, A
    NOBES, MJ
    [J]. RADIATION EFFECTS AND DEFECTS IN SOLIDS, 1982, 62 (3-4): : 119 - 152
  • [9] NI/CR INTERFACE WIDTH DEPENDENCE ON SPUTTERED DEPTH
    DAVARYA, F
    ROUSH, ML
    FINE, J
    ANDREADIS, TD
    GOKTEPE, OF
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1983, 1 (02): : 467 - 470
  • [10] SPUTTER DEPTH PROFILES OF NI/CR THIN-FILM STRUCTURES OBTAINED FROM THE EMISSION OF AUGER ELECTRONS AND X-RAYS
    FINE, J
    NAVINSEK, B
    DAVARYA, F
    ANDREADIS, TD
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1982, 20 (03): : 449 - 462