DIFFUSION AND ISOMER-SHIFT OF INTERSTITIAL IRON IN SILICON OBSERVED VIA IN-BEAM MOSSBAUER-SPECTROSCOPY

被引：67

作者：

SCHWALBACH, P ^{[1
]}

LAUBACH, S ^{[1
]}

HARTICK, M ^{[1
]}

KANKELEIT, E ^{[1
]}

KECK, B ^{[1
]}

MENNINGEN, M ^{[1
]}

SIELEMANN, R ^{[1
]}

机构：

[1] HAHN MEITNER INST KERNFORSCH BERLIN GMBH,W-1000 BERLIN 39,GERMANY

来源：

PHYSICAL REVIEW LETTERS | 1990年 / 64卷 / 11期

关键词：

D O I：

10.1103/PhysRevLett.64.1274

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

Diffusion of interstitial iron in silicon could be observed on an atomic scale for the first time: Coulomb-excited Fe57 nuclei were implanted into high-purity n-type silicon Mössbauer spectra were recorded at temperatures between 300 and 850 K. The diffusional broadening of one spectral component identified as interstitial Fe could be observed. The isomer shift of interstitial Fe in Si was determined and the assumption that one single mechanism is governing the diffusion of Fe in Si between 300 and 1500 K is confirmed. © 1990 The American Physical Society.

引用

页码：1274 / 1277

页数：4

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