AEROSOL ASSISTED CHEMICAL VAPOR-DEPOSITION OF SUPERCONDUCTING YBA2CU3O7-X

A hybrid process, aerosol-assisted chemical vapor deposition (AACVD), is described for reproducible preparation of superconducting thin films of YBa2Cu3O7-x. The process consists of atomizing a toluene solution of the Y, Ba, and Cu tetramethylheptanedionato complexes using an aerosol generator. The aerosol is transported into a CVD reactor where solvent and precursor evaporation and deposition occur at atmospheric pressure on heated substrates. The process provides stable evaporation rates for all three precursors, yielding constant film stoichiometry throughout the deposition period and from film to film. Superconducting films may be deposited in-situ at substrate heater temperatures above 825-degrees-C, or may be formed at lower temperatures by deposition followed by post-deposition annealing at higher temperatures. The microstructure and quality of films are highly dependent on the conditions employed in deposition and in the case of films deposited below 825-degrees-C, the post-deposition annealing conditions. Superconducting films prepared by the AACVD/post-annealing process have a metallic normal state resistivity signature with a zero resistance temperature typically above 88K, and are highly c-axis oriented. Transport critical current densities measured at 75 K on polycrystalline films prepared by the AACVD process are 220 000 A/cm2 and 84 000 A/cm2 at self-field and 0.1 T, respectively.