CHARACTERIZATION OF REACTIVELY SPUTTERED RUTHENIUM DIOXIDE FOR VERY LARGE-SCALE INTEGRATED METALLIZATION

被引：135

作者：

KRUSINELBAUM, L

WITTMER, M

YEE, DS

机构：

来源：

APPLIED PHYSICS LETTERS | 1987年 / 50卷 / 26期

关键词：

D O I：

10.1063/1.97673

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1879 / 1881

页数：3

共 17 条

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[8] EFFECTS OF DEPOSITION METHODS ON THE TEMPERATURE-DEPENDENT RESISTIVITY OF TUNGSTEN FILMS [J].

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