DEPOSITION SCHEME OF TRANSPARENT AND SEMICONDUCTING POLYMER-FILMS FROM METHANE PLASMA-PREPARED USING ECR APPARATUS

被引：5

作者：

FUJITA, T

INAGAKI, C

UYAMA, H

MATSUMOTO, O

机构：

[1] Department of Chemistry, Aoyama Gakuin University, Setagaya-ku, Tokyo 157, Chitosedai

来源：

关键词：

D O I：

10.1149/1.2086744

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

[No abstract available]

引用

页码：1645 / 1647

页数：3

共 6 条

FUJITA, T ;

MATSUMOTO, O .

[2]

KIMURA S, 1985, J ELECTROCHEM SOC, V132, P1468

SADHIR, RK ;

JAMES, WJ ;

AUERBACH, RA .

[4] ELECTRIC PROBE MEASUREMENTS IN AN ECR PLASMA CVD APPARATUS [J].

SHIRAI, K ;

IIZUKA, T ;

GONDA, S .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1989, 28 (05) :897-902

[5]

SUHR H, 1988, PLASMA CHEM PLASMA P, V135, P809

[6] PROCESS MONITORING OF A-C-H PLASMA DEPOSITION [J].

WILD, C ;

WAGNER, J ;

KOIDL, P .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1987, 5 (04) :2227-2230