MODELING ION-ASSISTED DEPOSITION OF CEO2 FILMS

被引:77
作者
MULLER, KH
机构
来源
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING | 1986年 / 40卷 / 04期
关键词
D O I
10.1007/BF00616596
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
引用
收藏
页码:209 / 213
页数:5
相关论文
共 13 条
  • [1] Biersack J.P., 1982, ION IMPLANTATION TEC, P122, DOI DOI 10.1007/978-3-642-68779-2_5
  • [2] SPUTTERING STUDIES WITH THE MONTE-CARLO PROGRAM TRIM.SP
    BIERSACK, JP
    ECKSTEIN, W
    [J]. APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1984, 34 (02): : 73 - 94
  • [3] COLUMNAR MICROSTRUCTURE IN VAPOR-DEPOSITED THIN-FILMS
    DIRKS, AG
    LEAMY, HJ
    [J]. THIN SOLID FILMS, 1977, 47 (03) : 219 - 233
  • [4] GUENTHER KH, 1976, APPL OPTICS, V15, P2992, DOI 10.1364/AO.15.002992
  • [5] SIMULATION OF STRUCTURAL ANISOTROPY AND VOID FORMATION IN AMORPHOUS THIN-FILMS
    HENDERSON, D
    BRODSKY, MH
    CHAUDHARI, P
    [J]. APPLIED PHYSICS LETTERS, 1974, 25 (11) : 641 - 643
  • [6] Kubaschewski O., 1967, METALLURGICAL THERMO
  • [7] MODIFICATION OF THE OPTICAL AND STRUCTURAL-PROPERTIES OF DIELECTRIC ZRO2 FILMS BY ION-ASSISTED DEPOSITION
    MARTIN, PJ
    NETTERFIELD, RP
    SAINTY, WG
    [J]. JOURNAL OF APPLIED PHYSICS, 1984, 55 (01) : 235 - 241
  • [8] MULLER KH, 1985, J APPL PHYS, V58, P2573, DOI 10.1063/1.335885
  • [9] MULLER KH, 1986, J APPL PHYS, V59, P2803, DOI 10.1063/1.336960
  • [10] PROPERTIES OF CEO2 THIN-FILMS PREPARED BY OXYGEN-ION-ASSISTED DEPOSITION
    NETTERFIELD, RP
    SAINTY, WG
    MARTIN, PJ
    SIE, SH
    [J]. APPLIED OPTICS, 1985, 24 (14): : 2267 - 2272